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Sku 98-8810-5G
STREM
Technical Notes:
1.AL D/CVD precursor for Si thin films 
References:
1.J. Electrochem. Soc. 2008, 155, G163
2.ECS Transactions, 2011, 35, 191
3.J. Electrochem. Soc 2012. 159, H277
4.Chem. Vap. Deposition 2013 19, 125
5.IEEE Electron Device L ett. 2010, 31, 857
6.J. Vac. Sci. Technol. A, 2015, 33, 01A137
7.C hem. Mater. 2017.29, 4920
8.Plasma Process Polym. 2019, 16, 1 900032
9.Nanotechnology.2021 32. 075706
10.J. Vac. Sci. Technol. A. 2016, 34, 01A136